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About ICMOVPE-IX



May 31-June 4, 1998  ·  La Jolla, California
NINTH INTERNATIONAL CONFERENCE ON METAL ORGANIC VAPOR PHASE EPITAXY

Sponsored by The Minerals, Metals, & Materials Society (TMS) and the American Association for Crystal Growth, the Ninth International Conference on Metal Organic Vapor Phase Epitaxy (ICMOVPE-IX), will be held May 31 through June 4, 1998, at the Sheraton Grande Torrey Pines Hotel, La Jolla, California.

The conference builds upon the strong tradition of previous conferences of presenting the latest advances in the science, technology, and applications of MOVPE and related growth techniques. The objective of the conference is to bring together a wide spectrum of specialists from industry, commerce, academia, and national laboratories to present their most recent progress in the fundamental and applied aspects of MOVPE technology.


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NINTH INTERNATIONAL CONFERENCE ON METAL ORGANIC VAPOR PHASE EPITAXY
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SCENES FROM THE MEETING
AT-MEETING PROGRAM AS A PDF FILE
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CONFERENCE COMMITTEE
Conference Chairs: Thomas F. Kuech, University of Wisconsin at Madison, 1415 Engineering Dr., Madison, WI 53706; telephone (608) 263-2922; fax (608) 265-4036; e-mail kuech@engr.wisc.edu; Ronald Moon, Hewlett Packard Laboratories, 3500 Deer Creek Road, Palo Alto, CA 94304-1392; telephone (415) 857-4673; fax (415) 857-2379; e-mail ron_moon@hpl.hp.com; Program Co-Chairs: Russell Dupuis, University of Texas at Austin, Microelectronics Research Center, MER 1.606D-R9900, Austin, Texas 78712-1100; telephone (512) 471-0537; fax (512) 471-8575; e-mail dupuis@mail.utexas.edu; Klaus Jensen, Massachusetts Institute of Technology, Dept. of Chemical Engineering, Building 66-566, 25 Ames Street, Cambridge, MA 02139; telephone (617) 253-4589; fax (617) 258-8224; e-mail kfjensen@mit.edu; Publication Chairs: Gerald B. Stringfellow, University of Utah at Salt Lake City; Robert Biefeld, Sandia National Laboratories; Treasurers: Kurt Gaskill, Naval Research Laboratory; Michael Tischler, Epitronics; Local Arrangements: Arthur Clawson, University of California, San Diego; Industrial Liaison: P. Daniel Dapkus, University Southern California
PROGRAM COMMITTEE
Ishwara Bhat, Rensselaer Polytechnic Institute; Rajaram Bhat, Corning, Inc.; Robert Biefeld, Sandia National Laboratory; James Coleman, University of Illinois at Urbana; Steve DenBaars, University of California at Santa Barbara; Kurt Gaskill, Naval Research Laboratory; Thomas F. Kuech, University of Wisconsin at Madison; Ronald Moon, Hewlett Packard Laboratories; Jerry Olson, National Renewable Energy Laboratory; Gerald B. Stringfellow, University of Utah at Salt Lake City; Michael Tischler, Epitronics
INTERNATIONAL ADVISORY COMMITTEE
Isamu Akasaki, Meijo University, Nagoya, Japan; Piet Demeester, Rijsuniversiteit Gent, Belgium; Takashi Fukui, Hokkaido University, Sapporo, Japan; Kazuhito Furuya, Tokyo Institute of Technology, Tokyo, Japan; Klaus Heime, RWTH Aachen, Aachen, Germany; Stuart Irvine, NEWI, Wrexham, United Kingdom; Hiroji Kawai, Sony Corporation, Yokohama, Japan; Maartin Leys, Technical University, Eindhoven, The Netherlands; Nigel Mason, University of Oxford, United Kingdom; Shigekazu Minagawa, Hitachi Central Research Laboratory, Tokyo, Japan; Andre Mircea, CNET, Bagneaux, France; Rodney Moss, Hewlett Packard, Ipswich, United Kingdom; Brian Mullin, Malvern, United Kingdom; Andrew W. Nelson, Epitaxial Products, Cardiff, United Kingdom; Kentaro Onabe, The University of Tokyo, Japan; Wolfgang Richter, Technische Universitat Berlin, Berlin, Germany; Lars Samuelson, Lund University, Lund, Sweden; Eberhard Veuhoff, Siemens AG, Munich, Germany


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